intel powers up asml's high-na euv: a chipmaking revolution

2025-02-25 asml

San Jose, Tuesday, 25 February 2025.
intel reports that the first asml high numerical aperture (high-na) lithography machines are in production at its california factories. intel has already produced 30,000 wafers using these machines. this represents a significant leap in chip manufacturing. the new machines promise smaller, faster, and more efficient chips. early data suggests the new asml machines are twice as reliable as previous models, potentially saving time and money by reducing the number of exposures needed. this advancement is crucial for intel’s competitive edge.

asml’s lithography leadership

ASML stands as a critical player in the semiconductor industry [GPT]. The company possesses a virtual monopoly in extreme ultraviolet (EUV) lithography, a technology essential for manufacturing advanced chips [8]. Intel’s embrace of ASML’s High-NA EUV machines underscores ASML’s significance [1]. These machines, utilizing beams of light to print features onto chips, enable fewer exposures, translating to time and cost savings for manufacturers [2]. Imec presented electrical test results on 20 nm pitch metal line structures patterned after single-exposure High NA EUV lithography [3].

stock market impact

Intel’s adoption of ASML’s High-NA EUV technology signals confidence in ASML’s capabilities, potentially bolstering ASML’s stock [1]. Positive early data regarding the machines’ reliability can further enhance investor sentiment [2]. ASML’s technology allows for the creation of more powerful and energy-efficient chips [1]. This positions ASML as a key enabler of advancements in artificial intelligence, data centers, and other high-growth sectors [7]. Microsoft plans to spend $80 billion on building data centers globally this year [8].

competitive dynamics

Intel’s move is a strategic effort to regain its competitive standing against rivals like Taiwan Semiconductor Manufacturing Co. (TSMC) [2]. TSMC’s revenue climbed 36% to $23.5 billion last quarter, with earnings per ADR soaring 50% to $1.94 [8]. Previously, Intel lagged in adopting earlier EUV lithography, contributing to its loss of market leadership [2]. Now, Intel aims to leverage the High-NA EUV machines to develop its 18A manufacturing technology, expected to be in mass production later this year [2]. The 18A process is known as a turning point, it combines the greatest transistor innovation in over a decade [6].

future outlook and asml orders

The success of Intel’s deployment could influence ASML’s future order book [1]. Other major chipmakers may follow suit to stay competitive [alert! ‘Requires further information to confirm’], driving increased demand for ASML’s advanced lithography systems [GPT]. ASML executives are reportedly meeting with TSMC to discuss the latter’s roadmap for the next few years [8]. The demand for NAND flash is recovering, especially for small-capacity MLC products [7]. Intel plans to use high-NA EUV technology in production in 2027 [8].

Bronnen

EUV lithography Chip manufacturing