high-na euv: intel pushes boundaries despite adoption roadblocks

2025-04-17 asml

eindhoven, Thursday, 17 April 2025.
intel is at the forefront of high-na euv lithography. widespread adoption is slow. the asml twinscan exe:5000 machine costs between $380 million and $400 million. intel is already seeing benefits. in one instance, intel replaced a 40-step low-na process with a 10-step high-na process. samsung reported cycle time improvements of 60%. broader use of high-na euv may depend on further cost reductions and overcoming limitations in exposure field size.

asml’s market position

ASML remains the dominant player in semiconductor lithography [4]. The company’s first-quarter 2025 results show its strength [5]. ASML reported net sales of €7.7 billion and a gross margin of 54% [5]. Net income reached €2.4 billion [5]. New orders totaled €3.9 billion, including €1.2 billion for EUV systems [5]. ASML shipped its fifth High-NA EUV system in the first quarter, bringing the total to three customers using the technology [5]. The company anticipates net sales between €7.2 billion and €7.7 billion for the second quarter of 2025 [5].

high-na euv adoption and asml’s technological leadership

ASML’s technological advancements, especially in High-NA EUV, are crucial for maintaining its leadership [1]. Intel has processed 30,000 wafers using ASML’s Twinscan EXE:5000 High-NA tool [1][3]. The SPIE conference in February 2025 highlighted the performance of High-NA systems [8]. ASML CEO Christophe Fouquet noted customers are seeing the value of High-NA [2]. ASML shipped the fifth and final EXE:5000 High NA system in Q1 and will begin shipping the EXE:5200 in Q2 [8]. These advancements solidify ASML’s position as a leader in lithography technology, despite challenges in broad adoption [1].

financial outlook and stock implications

ASML’s financial forecasts for 2025 remain positive, with expected revenue between €30 billion and €35 billion and gross margins between 51% and 53% [5]. The company’s strong Q1 performance, with logic and memory accounting for 58% and 42% of net system sales, respectively, supports this outlook [8]. However, ASML CFO Roger Dassen acknowledged potential impacts from tariffs [5]. These include tariffs on systems shipped to the U.S., parts for field operations, and materials imported for manufacturing [5]. Despite these concerns, ASML’s focus on innovation and market leadership suggests continued growth [8].

cost considerations and future prospects

While High-NA EUV tools have a high initial cost, nearly $400 million, they can yield savings by reducing multi-patterning steps [3]. IBM data indicates High-NA exposure is 2.5 times more expensive than Low-NA [3]. Yet, for processes requiring three or more Low-NA masks, High-NA becomes cost-effective [3]. ASML is also exploring larger 6x12-inch photomasks to boost throughput [1][3]. The company anticipates customers will begin using High-NA systems on a few layers in 2026-2027 [8]. ASML projects a revenue opportunity between €44 billion and €60 billion by 2030, with gross margins between 56% and 60% [8].

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high-na euv chipmaking costs